SUBSTRATE LIQUID PROCESSING APPARATUS AND SUBSTRATE LIQUID PROCESSING METHOD

PROBLEM TO BE SOLVED: To reduce running costs required for substrate liquid processing.SOLUTION: A substrate liquid processing apparatus (1) processes a substrate (6) with a mixed liquid in which a first chemical having a predetermined concentration and a predetermined temperature is mixed at a fixed ratio with a second chemical having a predetermined concentration and a predetermined temperature. The substrate liquid processing apparatus (1) comprises: a substrate processing chamber (16) for processing the substrate (6); a first chemical supply part (26) for supplying the first chemical to the substrate processing chamber (16); a second chemical supply part (27) for supplying the second chemical to the substrate processing chamber (16); a mixed liquid recovering part (41) for recovering the mixed liquid of the first chemical and the second chemical from the substrate processing chamber (16); a mixed liquid discarding part (42) which is branched from the mixed liquid recovering part (41), and discards one part of a predetermined amount of the mixed liquid; a first chemical replenishing part (43) for replenishing the mixed liquid recovering part (41) with the same amount of the first chemical as the one part of the predetermined amount of the mixed liquid discarded in the mixed liquid discarding part (42) at a higher concentration than the predetermined concentration of the first chemical; and a communicating part (44) for making the mixed liquid recovering part (41) communicate with the first chemical supply part (26).