ION IMPLANTER

PROBLEM TO BE SOLVED: To solve the problems of a conventional ion implanter that a seal member, i.e., a seal ring, ruptures, that an O-ring projects and that product defects occur.SOLUTION: The ion implanter has a system for incorporating a conductor in a seal ring, and detecting abnormalities of th...

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Bibliographische Detailangaben
Hauptverfasser: IJICHI MASAYOSHI, UDO DAISUKE, ISHIMARU HIROYUKI, ARAKI MAMORU
Format: Patent
Sprache:eng
Schlagworte:
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Beschreibung
Zusammenfassung:PROBLEM TO BE SOLVED: To solve the problems of a conventional ion implanter that a seal member, i.e., a seal ring, ruptures, that an O-ring projects and that product defects occur.SOLUTION: The ion implanter has a system for incorporating a conductor in a seal ring, and detecting abnormalities of the seal ring by monitoring the current value of the conductor. Other ion implanter has a cavity in the seal ring, and detects abnormalities of the seal ring by compressing the cavity and detecting the pressure in the cavity.