PROXIMITY EXPOSURE APPARATUS

PROBLEM TO BE SOLVED: To precisely arrange a mask and a substrate at a predetermined interval and reduce a burden of transferring or tilting a mask holder on an actuator.SOLUTION: A proximity exposure apparatus 100 comprises: a mask holder 20 for holding a mask 2 above a substrate 1; a top frame 22...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
1. Verfasser: PARK SEIKEN
Format: Patent
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:PROBLEM TO BE SOLVED: To precisely arrange a mask and a substrate at a predetermined interval and reduce a burden of transferring or tilting a mask holder on an actuator.SOLUTION: A proximity exposure apparatus 100 comprises: a mask holder 20 for holding a mask 2 above a substrate 1; a top frame 22 for supporting the mask holder 20 in a manner capable of moving and tilting it in a vertical direction; multiple Z tilting mechanisms 30; multiple air springs 23; and a main controller 50. The Z tilting mechanisms are supported by the top frame 22, and move and tilt the mask holder 20 in a vertical direction. The air springs 23 are arranged between the mask holder 20 and the top frame 22, and expand and shrink in a vertical direction in association with changes in pressure due to air filled inside. The main controller 50 controls the pressure of the air springs 23 and driving of the Z tilting mechanisms 23 so as to arrange the mask 2 and the substrate 1 approximately in parallel to each other at a prescribed interval, and moves and tilts the mask holder 20 in a vertical direction.