PROXIMITY EXPOSURE APPARATUS
PROBLEM TO BE SOLVED: To precisely arrange a mask and a substrate at a predetermined interval and reduce a burden of transferring or tilting a mask holder on an actuator.SOLUTION: A proximity exposure apparatus 100 comprises: a mask holder 20 for holding a mask 2 above a substrate 1; a top frame 22...
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Sprache: | eng |
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Zusammenfassung: | PROBLEM TO BE SOLVED: To precisely arrange a mask and a substrate at a predetermined interval and reduce a burden of transferring or tilting a mask holder on an actuator.SOLUTION: A proximity exposure apparatus 100 comprises: a mask holder 20 for holding a mask 2 above a substrate 1; a top frame 22 for supporting the mask holder 20 in a manner capable of moving and tilting it in a vertical direction; multiple Z tilting mechanisms 30; multiple air springs 23; and a main controller 50. The Z tilting mechanisms are supported by the top frame 22, and move and tilt the mask holder 20 in a vertical direction. The air springs 23 are arranged between the mask holder 20 and the top frame 22, and expand and shrink in a vertical direction in association with changes in pressure due to air filled inside. The main controller 50 controls the pressure of the air springs 23 and driving of the Z tilting mechanisms 23 so as to arrange the mask 2 and the substrate 1 approximately in parallel to each other at a prescribed interval, and moves and tilts the mask holder 20 in a vertical direction. |
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