PHOTOSENSITIVE COPPER PASTE AND ORGANIC-INORGANIC COMPOSITE CONDUCTIVE PATTERN MANUFACTURING METHOD

PROBLEM TO BE SOLVED: To provide a photosensitive copper paste that has excellent storage stability, does not gel particularly even after long-term storage, and can form an excellent high-definition pattern.SOLUTION: A photosensitive copper paste contains an organic component including a photosensit...

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Bibliographische Detailangaben
Hauptverfasser:	KUSANO KAZUTAKA, TOMINAGA KANOKO
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CABLES CINEMATOGRAPHY CONDUCTORS ELECTRICITY ELECTROGRAPHY HOLOGRAPHY INSULATORS MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING ORDIELECTRIC PROPERTIES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a photosensitive copper paste that has excellent storage stability, does not gel particularly even after long-term storage, and can form an excellent high-definition pattern.SOLUTION: A photosensitive copper paste contains an organic component including a photosensitive organic component and copper powder. With respect to 100 pts.wt. of the photosensitive organic component in the photosensitive copper paste, 2 pts.wt. or more and less than 5 pts.wt. of a photopolymerization initiator including an oxime ester compound is contained.