LIGHT-TRANSMISSIVE CONDUCTIVE FILM, AND METHOD FOR MANUFACTURING AND USE OF THE SAME

PROBLEM TO BE SOLVED: To impart a desirable surface resistance value to a light-transmissive conductive film including (A) a light-transmissive support layer and (B) a light-transmissive conductive layer of 100 nm or larger in thickness including indium tin oxide.SOLUTION: A light-transmissive condu...

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Bibliographische Detailangaben
Hauptverfasser: KAJITA KEIICHI, MORI SANSHIRO, TANAKA OSAMU
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To impart a desirable surface resistance value to a light-transmissive conductive film including (A) a light-transmissive support layer and (B) a light-transmissive conductive layer of 100 nm or larger in thickness including indium tin oxide.SOLUTION: A light-transmissive conductive film is characterized in that a peak of X-ray diffraction of a light-transmissive conductive flayer (B) meets requirements (i) to (iii). Namely, (i) a peak of a (222) plane is strongest; (ii) a half-value width of the peak of the (222) plane is 0.5 or less; and (iii) peak intensities of a (332) plane and a (134) plane are both 3% or larger of a peak intensity of the (222) plane.