TABLET FOR VAPOR DEPOSITION AND METHOD FOR PRODUCING THE SAME

PROBLEM TO BE SOLVED: To provide a tablet for vapor deposition which is composed of an indium oxide sintered body containing, for example, tin as a dopant and can hardly be damaged even when irradiated with high power electron beams or high output plasma, and a method for producing the tablet.SOLUTI...

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Hauptverfasser:	SOGABE KENTARO, HASHIGUCHI KAN, OZAWA MAKOTO, KUWAHARA MASAKAZU
Format:	Patent
Sprache:	eng
Schlagworte:	ARTIFICIAL STONE CEMENTS CERAMICS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDINGMATERIALS CONCRETE DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL LIME, MAGNESIA METALLURGY REFRACTORIES SLAG SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TREATMENT OF NATURAL STONE
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a tablet for vapor deposition which is composed of an indium oxide sintered body containing, for example, tin as a dopant and can hardly be damaged even when irradiated with high power electron beams or high output plasma, and a method for producing the tablet.SOLUTION: A tablet for vapor deposition is produced by burning a powder mixture comprising calcined first raw material powder and uncalcined second raw material powder, includes an indium oxide sintered body containing at least one selected from Sn, W, Ti, etc., as a dopant, and has a relative density of ≥50% and ≤80%. When the average particle size of first sintered particles which constitute the indium oxide sintered body and are derived from the first raw material powder is D1, and the average particle size of second sintered particles which constitute the indium oxide sintered body and are derived from the second raw material powder is D2, the particle size ratio [(D2/D1)×100(%)] of the average particle size D2 of the second sintered particles to the average particle size D1 of the first sintered particles is ≥3% and ≤15%.