ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMATION METHOD USING SAID COMPOSITION, AND ELECTRONIC DEVICE MANUFACTURING METHOD AND ELECTRONIC DEVICE

PROBLEM TO BE SOLVED: To provide: an actinic ray-sensitive or radiation-sensitive resin composition excellent in DOF and pattern roughness characteristics such as LWR without much deterioration in performance over time; an actinic ray-sensitive or radiation-sensitive film and a pattern formation met...

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Bibliographische Detailangaben
Hauptverfasser:	SHIBUYA AKINORI, IWATO KAORU, TOKUGAWA YOKO, SUGIYAMA SHINICHI, MATSUDA TOMOKI, FUKUHARA TOSHIAKI, ITO JUNICHI, TANGO NAOHIRO, KATAOKA SHOHEI, YOSHITOME MASAHIRO
Format:	Patent
Sprache:	eng
Schlagworte:	ACYCLIC OR CARBOCYCLIC COMPOUNDS ADHESIVES APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON DYES ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE MATERIALS THEREFOR METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS ORGANIC CHEMISTRY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PAINTS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS POLISHES THEIR PREPARATION OR CHEMICAL WORKING-UP
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide: an actinic ray-sensitive or radiation-sensitive resin composition excellent in DOF and pattern roughness characteristics such as LWR without much deterioration in performance over time; an actinic ray-sensitive or radiation-sensitive film and a pattern formation method which use the composition; and an electronic device manufacturing method and an electronic device.SOLUTION: An actinic ray-sensitive or radiation-sensitive resin composition contains (A) a resin whose solubility in an alkaline developer is increased by the action of an acid, (B) a compound which is represented by the specified general formula (1) and generates an acid upon exposure to an actinic ray or radiation, and (C) a low molecular weight compound having on a nitrogen atom a group leaving by the action of an acid. (The meaning of each symbol in the formula is described in the claims.)