PREPREG, SUBSTRATE, SEMICONDUCTOR DEVICE, METHOD OF MANUFACTURING PREPREG, METHOD OF MANUFACTURING SUBSTRATE, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

PROBLEM TO BE SOLVED: To provide a prepreg which prevents air bubbles from remaining when laminated and which has excellent mechanical strength, a substrate provided with the prepreg, a semiconductor device using the substrate, and methods of manufacturing them.SOLUTION: A prepreg 1 includes a fiber...

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Hauptverfasser: HATANO HARUYUKI, ANADA KOHEI
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a prepreg which prevents air bubbles from remaining when laminated and which has excellent mechanical strength, a substrate provided with the prepreg, a semiconductor device using the substrate, and methods of manufacturing them.SOLUTION: A prepreg 1 includes a fiber base material 2 formed in a layered form, and a resin layer 32 formed on at least one surface side of the fiber base material 2 and structured of a resin composition. The prepreg 1 includes a void layer 21 in which the resin composition is not impregnated and which is formed in at least a part of the fiber base material 2.