COMPOSITIONS FOR POLISHING ALUMINUM/COPPER AND TITANIUM IN DAMASCENE STRUCTURES

PROBLEM TO BE SOLVED: To provide compositions and methods for planarizing or polishing a substrate.SOLUTION: The composition contains: an abrasive comprising alumina particles optionally treated with a polymer; an α-hydroxycarboxylic acid; an oxidizing agent that oxidizes at least one metal; polyacr...

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Hauptverfasser: VLASTA BRUSIC, JEFFREY DYSARD, THOMPSON CHRISTOPHER
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creator VLASTA BRUSIC
JEFFREY DYSARD
THOMPSON CHRISTOPHER
description PROBLEM TO BE SOLVED: To provide compositions and methods for planarizing or polishing a substrate.SOLUTION: The composition contains: an abrasive comprising alumina particles optionally treated with a polymer; an α-hydroxycarboxylic acid; an oxidizing agent that oxidizes at least one metal; polyacrylic acid; optionally, a calcium-containing compound; optionally, a biocide; optionally, a pH adjusting agent; and water. The method uses the composition to chemically-mechanically polish a substrate.
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subjects ADHESIVES
BASIC ELECTRIC ELEMENTS
CHEMISTRY
DRESSING OR CONDITIONING OF ABRADING SURFACES
DYES
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
GRINDING
MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING
MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE
METALLURGY
MISCELLANEOUS APPLICATIONS OF MATERIALS
MISCELLANEOUS COMPOSITIONS
NATURAL RESINS
PAINTS
PERFORMING OPERATIONS
POLISHES
POLISHING
SEMICONDUCTOR DEVICES
TRANSPORTING
title COMPOSITIONS FOR POLISHING ALUMINUM/COPPER AND TITANIUM IN DAMASCENE STRUCTURES
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