CURABLE RESIN COMPOSITION FOR PHOTO SPACER, AND COLUMNAR SPACER

PROBLEM TO BE SOLVED: To provide a curable resin composition for photo spacer from which a photo spacer having both elastic recovery and smaller diameter can be obtained, in order to provide a columnar spacer excellent in adhesion to a glass substrate.SOLUTION: The curable resin composition for phot...

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Bibliographische Detailangaben
Hauptverfasser:	TANAKA SHINSUKE, MINATOBE YUTA, KAHARA KOJI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING ELECTROGRAPHY FREQUENCY-CHANGING HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MATERIALS THEREFOR METALLURGY NON-LINEAR OPTICS OPTICAL ANALOGUE/DIGITAL CONVERTERS OPTICAL LOGIC ELEMENTS OPTICS ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF THEIR PREPARATION OR CHEMICAL WORKING-UP
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a curable resin composition for photo spacer from which a photo spacer having both elastic recovery and smaller diameter can be obtained, in order to provide a columnar spacer excellent in adhesion to a glass substrate.SOLUTION: The curable resin composition for photo spacer that is used for manufacturing a columnar spacer of a liquid crystal cell includes: a photosensitive polymer obtained by reacting acid radical of acid radical containing polymer synthesized from a monomer component including as essential monomer a monomer to which acid radical can be introduced and a monomer having a main chain to which a ring structure can be introduced, with a compound including radical polymerizable unsaturated double bond and a functional group reactive with acid radical; a polyfunctional monomer; an ultraviolet absorber having maximum absorption wavelength in the range of 280 to 380 nm; and a photoinitiator. The polyfunctional monomer has a double bond amount of 9.0 mmol/g or more.