ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMATION METHOD USING SAID COMPOSITION, AND ELECTRONIC DEVICE MANUFACTURING METHOD AND ELECTRONIC DEVICE
PROBLEM TO BE SOLVED: To provide: an actinic ray-sensitive or radiation-sensitive resin composition improved in CDU and roundness and suited even for a liquid immersion process with a line width of 45 nm or less; an actinic ray-sensitive or radiation-sensitive film and a pattern formation method whi...
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| creator | SHIBUYA AKINORI IWATO KAORU TOKUGAWA YOKO SUGIYAMA SHINICHI MATSUDA TOMOKI FUKUHARA TOSHIAKI ITO JUNICHI TANGO NAOHIRO KATAOKA SHOHEI YOSHITOME MASAHIRO |
| description | PROBLEM TO BE SOLVED: To provide: an actinic ray-sensitive or radiation-sensitive resin composition improved in CDU and roundness and suited even for a liquid immersion process with a line width of 45 nm or less; an actinic ray-sensitive or radiation-sensitive film and a pattern formation method which use the composition; and an electronic device manufacturing method and an electronic device.SOLUTION: An actinic ray-sensitive or radiation-sensitive resin composition contains a compound (A) represented by the specified general formula (1), and a resin (B) whose solubility in an alkaline developer is increased by the action of an acid. (The meaning of each symbol in the general formula (1) is described in the claims.) |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JP2013178370A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JP2013178370A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JP2013178370A3</originalsourceid><addsrcrecordid>eNqVjrEKwjAURbs4iPoPD2cLrR3qGpJX-6RJSpIWnEqROIkW6j_7G7bSQcRBpweHc-998-DBuCNFHAw7hhaVJUc1gjYDEMQcafWGDVpSwLUs9Ui02sBf-YwKCUwJKJlzaBRk2siXBBJdrgVUw8AeLCPxMTOEsEDujB7XBNbEESRTVTZ8UJkxNVV8VZfB7Nxeer-a7iJYZ-h4Hvru1vi-a0_-6u_NodxGcRKnuySNWPKT9ASbL1lg</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMATION METHOD USING SAID COMPOSITION, AND ELECTRONIC DEVICE MANUFACTURING METHOD AND ELECTRONIC DEVICE</title><source>esp@cenet</source><creator>SHIBUYA AKINORI ; IWATO KAORU ; TOKUGAWA YOKO ; SUGIYAMA SHINICHI ; MATSUDA TOMOKI ; FUKUHARA TOSHIAKI ; ITO JUNICHI ; TANGO NAOHIRO ; KATAOKA SHOHEI ; YOSHITOME MASAHIRO</creator><creatorcontrib>SHIBUYA AKINORI ; IWATO KAORU ; TOKUGAWA YOKO ; SUGIYAMA SHINICHI ; MATSUDA TOMOKI ; FUKUHARA TOSHIAKI ; ITO JUNICHI ; TANGO NAOHIRO ; KATAOKA SHOHEI ; YOSHITOME MASAHIRO</creatorcontrib><description>PROBLEM TO BE SOLVED: To provide: an actinic ray-sensitive or radiation-sensitive resin composition improved in CDU and roundness and suited even for a liquid immersion process with a line width of 45 nm or less; an actinic ray-sensitive or radiation-sensitive film and a pattern formation method which use the composition; and an electronic device manufacturing method and an electronic device.SOLUTION: An actinic ray-sensitive or radiation-sensitive resin composition contains a compound (A) represented by the specified general formula (1), and a resin (B) whose solubility in an alkaline developer is increased by the action of an acid. (The meaning of each symbol in the general formula (1) is described in the claims.)</description><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; BASIC ELECTRIC ELEMENTS ; CINEMATOGRAPHY ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; SEMICONDUCTOR DEVICES</subject><creationdate>2013</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20130909&DB=EPODOC&CC=JP&NR=2013178370A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25562,76317</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20130909&DB=EPODOC&CC=JP&NR=2013178370A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>SHIBUYA AKINORI</creatorcontrib><creatorcontrib>IWATO KAORU</creatorcontrib><creatorcontrib>TOKUGAWA YOKO</creatorcontrib><creatorcontrib>SUGIYAMA SHINICHI</creatorcontrib><creatorcontrib>MATSUDA TOMOKI</creatorcontrib><creatorcontrib>FUKUHARA TOSHIAKI</creatorcontrib><creatorcontrib>ITO JUNICHI</creatorcontrib><creatorcontrib>TANGO NAOHIRO</creatorcontrib><creatorcontrib>KATAOKA SHOHEI</creatorcontrib><creatorcontrib>YOSHITOME MASAHIRO</creatorcontrib><title>ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMATION METHOD USING SAID COMPOSITION, AND ELECTRONIC DEVICE MANUFACTURING METHOD AND ELECTRONIC DEVICE</title><description>PROBLEM TO BE SOLVED: To provide: an actinic ray-sensitive or radiation-sensitive resin composition improved in CDU and roundness and suited even for a liquid immersion process with a line width of 45 nm or less; an actinic ray-sensitive or radiation-sensitive film and a pattern formation method which use the composition; and an electronic device manufacturing method and an electronic device.SOLUTION: An actinic ray-sensitive or radiation-sensitive resin composition contains a compound (A) represented by the specified general formula (1), and a resin (B) whose solubility in an alkaline developer is increased by the action of an acid. (The meaning of each symbol in the general formula (1) is described in the claims.)</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2013</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqVjrEKwjAURbs4iPoPD2cLrR3qGpJX-6RJSpIWnEqROIkW6j_7G7bSQcRBpweHc-998-DBuCNFHAw7hhaVJUc1gjYDEMQcafWGDVpSwLUs9Ui02sBf-YwKCUwJKJlzaBRk2siXBBJdrgVUw8AeLCPxMTOEsEDujB7XBNbEESRTVTZ8UJkxNVV8VZfB7Nxeer-a7iJYZ-h4Hvru1vi-a0_-6u_NodxGcRKnuySNWPKT9ASbL1lg</recordid><startdate>20130909</startdate><enddate>20130909</enddate><creator>SHIBUYA AKINORI</creator><creator>IWATO KAORU</creator><creator>TOKUGAWA YOKO</creator><creator>SUGIYAMA SHINICHI</creator><creator>MATSUDA TOMOKI</creator><creator>FUKUHARA TOSHIAKI</creator><creator>ITO JUNICHI</creator><creator>TANGO NAOHIRO</creator><creator>KATAOKA SHOHEI</creator><creator>YOSHITOME MASAHIRO</creator><scope>EVB</scope></search><sort><creationdate>20130909</creationdate><title>ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMATION METHOD USING SAID COMPOSITION, AND ELECTRONIC DEVICE MANUFACTURING METHOD AND ELECTRONIC DEVICE</title><author>SHIBUYA AKINORI ; IWATO KAORU ; TOKUGAWA YOKO ; SUGIYAMA SHINICHI ; MATSUDA TOMOKI ; FUKUHARA TOSHIAKI ; ITO JUNICHI ; TANGO NAOHIRO ; KATAOKA SHOHEI ; YOSHITOME MASAHIRO</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2013178370A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2013</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>SHIBUYA AKINORI</creatorcontrib><creatorcontrib>IWATO KAORU</creatorcontrib><creatorcontrib>TOKUGAWA YOKO</creatorcontrib><creatorcontrib>SUGIYAMA SHINICHI</creatorcontrib><creatorcontrib>MATSUDA TOMOKI</creatorcontrib><creatorcontrib>FUKUHARA TOSHIAKI</creatorcontrib><creatorcontrib>ITO JUNICHI</creatorcontrib><creatorcontrib>TANGO NAOHIRO</creatorcontrib><creatorcontrib>KATAOKA SHOHEI</creatorcontrib><creatorcontrib>YOSHITOME MASAHIRO</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>SHIBUYA AKINORI</au><au>IWATO KAORU</au><au>TOKUGAWA YOKO</au><au>SUGIYAMA SHINICHI</au><au>MATSUDA TOMOKI</au><au>FUKUHARA TOSHIAKI</au><au>ITO JUNICHI</au><au>TANGO NAOHIRO</au><au>KATAOKA SHOHEI</au><au>YOSHITOME MASAHIRO</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMATION METHOD USING SAID COMPOSITION, AND ELECTRONIC DEVICE MANUFACTURING METHOD AND ELECTRONIC DEVICE</title><date>2013-09-09</date><risdate>2013</risdate><abstract>PROBLEM TO BE SOLVED: To provide: an actinic ray-sensitive or radiation-sensitive resin composition improved in CDU and roundness and suited even for a liquid immersion process with a line width of 45 nm or less; an actinic ray-sensitive or radiation-sensitive film and a pattern formation method which use the composition; and an electronic device manufacturing method and an electronic device.SOLUTION: An actinic ray-sensitive or radiation-sensitive resin composition contains a compound (A) represented by the specified general formula (1), and a resin (B) whose solubility in an alkaline developer is increased by the action of an acid. (The meaning of each symbol in the general formula (1) is described in the claims.)</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES |
| title | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMATION METHOD USING SAID COMPOSITION, AND ELECTRONIC DEVICE MANUFACTURING METHOD AND ELECTRONIC DEVICE |
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