LIQUID PROCESSING DEVICE, LIQUID PROCESSING METHOD, AND STORAGE MEDIUM STORING COMPUTER PROGRAM FOR PERFORMING LIQUID PROCESSING METHOD

PROBLEM TO BE SOLVED: To provide a liquid processing device capable of shortening the time required to generate a mixed chemical for substrate processing containing pure water and sulfuric acid.SOLUTION: A liquid processing device 200 comprises: a pure water supply unit 20; a pure water supply on-of...

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Hauptverfasser:	KOMIYA YOJI, EJIMA KAZUYOSHI
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLICMATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASSC23 AND AT LEAST ONEPROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25 NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a liquid processing device capable of shortening the time required to generate a mixed chemical for substrate processing containing pure water and sulfuric acid.SOLUTION: A liquid processing device 200 comprises: a pure water supply unit 20; a pure water supply on-off valve 27; a sulfuric acid supply unit 30; a sulfuric acid supply on-off valve 34; preparation tanks 11 and 12 which generate a mixed chemical by preparing pure water with sulfuric acid; and a liquid processing unit 210 which processes a substrate W with the generated mixed chemical. A circulation line 100 including a circulation pump 101 is coupled to the preparation tanks 11 and 12. A control unit 300 starts pure water supply to the preparation tanks 11 and 12, and controls a pure water supply on-off valve 26, the sulfuric acid supply on-off valve 34, and the circulation pump 101 so as to start sulfuric acid supply to the preparation tanks 11 and 12.