PROCESS LIQUID EXCHANGE METHOD AND SUBSTRATE PROCESSING APPARATUS

PROBLEM TO BE SOLVED: To provide a method for decreasing the consumption of a process liquid in a substrate processing apparatus during process liquid exchange.SOLUTION: A substrate processing apparatus includes an accumulation tank accumulating a process liquid, and a circulation line whose both en...

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Bibliographische Detailangaben
Hauptverfasser: KASAHARA MASATOSHI, SHIMOMURA SHINICHIRO
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a method for decreasing the consumption of a process liquid in a substrate processing apparatus during process liquid exchange.SOLUTION: A substrate processing apparatus includes an accumulation tank accumulating a process liquid, and a circulation line whose both ends are connected with the accumulation tank and in which the process liquid circulates, and performs liquid treatment on a substrate using the process liquid through a branch conduit line connected with the circulation line. A process liquid exchange method for exchanging the process liquid of the substrate processing apparatus includes: a process liquid drainage step where the process liquid in the accumulation tank is drained; a gas purge step where a purge gas is supplied to the circulation line to discharge the process liquid remaining in the circulation line from the circulation line; and a process liquid supply step where the process liquid is supplied to the accumulation tank.