SHOWER HEAD FOR MOCVD REACTOR, MOCVD REACTOR, MOCVD DEVICE, AND CLEANING METHOD

PROBLEM TO BE SOLVED: To provide a shower head, an MOCVD reactor, and an MOCVD device which are improved.SOLUTION: In one example embodiment, the shower head for an MOCVD reactor includes: a shower head body part which has a plurality of reactive gas supply paths formed therein so as to pierce the s...

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Bibliographische Detailangaben
1. Verfasser:	HAYASHI KAZUICHI
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a shower head, an MOCVD reactor, and an MOCVD device which are improved.SOLUTION: In one example embodiment, the shower head for an MOCVD reactor includes: a shower head body part which has a plurality of reactive gas supply paths formed therein so as to pierce the shower head in a thickness direction and has a cooling structure; and a shield plate which is removably attached to the shower head body and has 1-to-n manifold structures formed in portions corresponding to formation positions of respective reactive gas supply paths in the shower head body, so as to pierce the shower head in the thickness direction and does not have a cooling structure.