METHOD AND DEVICE FOR APPLYING TWO OR MORE TRIP CRITICAL VALUE TO DEVICE IN PROCESS CONTROL SYSTEM

PROBLEM TO BE SOLVED: To provide a method and device for applying two or more trip critical values to a device in a process control system.SOLUTION: The method includes: monitoring the value of a parameter associated with the operation of the device; and receiving an input showing the operating stat...

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Hauptverfasser:	KEITH RICHARD BELLVILLE, DAVID MARK SMITH, GODFREY R SHERRIFF, LAW GARY KEITH
Format:	Patent
Sprache:	eng
Schlagworte:	CONTROL OR REGULATING SYSTEMS IN GENERAL CONTROLLING FUNCTIONAL ELEMENTS OF SUCH SYSTEMS MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS ORELEMENTS PHYSICS REGULATING
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a method and device for applying two or more trip critical values to a device in a process control system.SOLUTION: The method includes: monitoring the value of a parameter associated with the operation of the device; and receiving an input showing the operating state of the device. A first input shows a first operating state, and a second input shows a second operating state. When receiving the first input, the value of the parameter is compared with a first trip critical value via a function block, and when receiving the second input, the value of the parameter is compared with a second trip critical value via the function block, and a response is executed on the basis of the comparison.