PATTERN FORMATION METHOD, PATTERN FORMATION DEVICE, TEMPLATE AND TEMPLATE INSPECTION METHOD

PROBLEM TO BE SOLVED: To provide a pattern formation method, a pattern formation device, a template and a template inspection method capable of accurately recognizing a state of an uneven pattern of the template.SOLUTION: In a pattern formation method, a template which includes a base material havin...

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Bibliographische Detailangaben
1. Verfasser:	TOKUE HIROSHI
Format:	Patent
Sprache:	eng
Schlagworte:	AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY PERFORMING OPERATIONS SEMICONDUCTOR DEVICES SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR SHAPING OR JOINING OF PLASTICS TRANSPORTING WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a pattern formation method, a pattern formation device, a template and a template inspection method capable of accurately recognizing a state of an uneven pattern of the template.SOLUTION: In a pattern formation method, a template which includes a base material having a main surface and an uneven pattern installed on the main surface of the base material and having a conductive pattern is used. The uneven pattern of the template is impressed on an object to be transferred to transfer a shape of the uneven pattern to the object to be transferred. The pattern formation method includes a process of determining whether or not a state of the uneven pattern is abnormal, based on electrical properties of a circuit including the conductive pattern.