METHOD OF MANUFACTURING VAPOR DEPOSITION MASK, AND METHOD OF MANUFACTURING ORGANIC SEMICONDUCTOR ELEMENT

PROBLEM TO BE SOLVED: To provide a method of manufacturing a vapor deposition mask capable of providing both high precision and light weight even if its size is increased, and to provide a method of manufacturing an organic semiconductor element capable of manufacturing a precision organic semicondu...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	NISHIMURA SUKEYUKI, OBATA KATSUYA, TAKEDA TOSHIHIKO
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC HEATING ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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