METHOD OF MANUFACTURING VAPOR DEPOSITION MASK, AND METHOD OF MANUFACTURING ORGANIC SEMICONDUCTOR ELEMENT

PROBLEM TO BE SOLVED: To provide a method of manufacturing a vapor deposition mask capable of providing both high precision and light weight even if its size is increased, and to provide a method of manufacturing an organic semiconductor element capable of manufacturing a precision organic semicondu...

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Hauptverfasser: NISHIMURA SUKEYUKI, OBATA KATSUYA, TAKEDA TOSHIHIKO
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a method of manufacturing a vapor deposition mask capable of providing both high precision and light weight even if its size is increased, and to provide a method of manufacturing an organic semiconductor element capable of manufacturing a precision organic semiconductor element.SOLUTION: A method of manufacturing a vapor deposition mask includes the steps of: preparing a metal plate with a resin layer in which a resin layer is provided on one surface of the metal plate; forming a metal mask with a resin layer by forming, on the metal plate of the metal plate with the resin layer, a slit that penetrates only the metal plate; and then forming a resin mask by forming a plurality of lines of openings in all directions which correspond to a pattern vapor-deposited on the resin layer, through radiation of laser from the metal mask side.