PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
PROBLEM TO BE SOLVED: To suppress fluctuation and variation of a plasma process in detail during single-time leaf plasma processing.SOLUTION: An OES measurement section 110 outputs a spectrometric measured value MOESat the end of each step or right after the end. A CD estimation section 140 determin...
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| creator | AKIMOTO TOSHIKAZU KAWANAMI HIROSHI |
| description | PROBLEM TO BE SOLVED: To suppress fluctuation and variation of a plasma process in detail during single-time leaf plasma processing.SOLUTION: An OES measurement section 110 outputs a spectrometric measured value MOESat the end of each step or right after the end. A CD estimation section 140 determines a CD estimated value ACDof each step using a CD estimation model AMtaken in from an estimation model storage section 142 and the spectrometric measured value MOES. A process control section 132 uses a CD estimated value ACDof a last step received from the CD estimation section 140 for automatic control over a controlled object 130 in a next step in addition to a process condition set value PCof the next step taken in from a recipe storage section 136 and a process control model CMof the next step taken in from a control model storage section 138. |
| format | Patent |
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| subjects | BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS SEMICONDUCTOR DEVICES |
| title | PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD |
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