PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PROBLEM TO BE SOLVED: To suppress fluctuation and variation of a plasma process in detail during single-time leaf plasma processing.SOLUTION: An OES measurement section 110 outputs a spectrometric measured value MOESat the end of each step or right after the end. A CD estimation section 140 determines a CD estimated value ACDof each step using a CD estimation model AMtaken in from an estimation model storage section 142 and the spectrometric measured value MOES. A process control section 132 uses a CD estimated value ACDof a last step received from the CD estimation section 140 for automatic control over a controlled object 130 in a next step in addition to a process condition set value PCof the next step taken in from a recipe storage section 136 and a process control model CMof the next step taken in from a control model storage section 138.