SUBSTRATE PROCESSING APPARATUS, MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE, AND PROGRAM

PROBLEM TO BE SOLVED: To easily remove by-products etc. remaining in an exhaust part.SOLUTION: A substrate processing apparatus includes: a processing chamber where a substrate is housed; a first gas supply part supplying a first process gas containing predetermined chemical elements to the substrat...

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Bibliographische Detailangaben
Hauptverfasser:	SUZAKI KENICHI, KOSHI YASUNOBU, YOSHINO AKIHITO
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To easily remove by-products etc. remaining in an exhaust part.SOLUTION: A substrate processing apparatus includes: a processing chamber where a substrate is housed; a first gas supply part supplying a first process gas containing predetermined chemical elements to the substrate; a second gas supply part supplying a second process gas containing predetermined chemical elements and halogen to the substrate; an exhaust part exhausting air in the processing chamber; a cleaning gas bypass supply part supplying a cleaning gas to the exhaust part without passing the cleaning gas through the processing chamber; a cleaning monitoring part provided at the exhaust part and detecting the state of the exhaust part; and a control part controlling the cleaning gas supply conducted by the cleaning gas bypass supply part according to the state of the exhaust part detected by the cleaning monitoring part.