MATERIAL SUPPLY DEVICE OF PLASMA VAPOR DEPOSITION APPARATUS

PROBLEM TO BE SOLVED: To provide a material supplying device of a plasma vapor deposition apparatus capable of diversifying variations in material supplying methods.SOLUTION: In a material supplying device 8, a film formation material M is supported by a support guide 16 passing through a slit 21 from a direction crossing a material supplying direction D. Thus, even when the film formation material M is supplied downward in a vertical direction, the film formation material M can be supported without causing any problems for the deposition of the film formation material M. Furthermore, by feeding the film formation material M in the material supplying direction D using a feeding mechanism 17, the film formation material M is supplied such that a distance between an object 10 to be treated and the film formation material M is substantially constant. Accordingly, even in a deposition down-type apparatus in which the material supplying direction D of the film formation material M is directed downward in the vertical direction, the film formation material M can be appropriately supplied, thereby diversifying variations in material supplying methods.