METHOD FOR EVALUATING INFRARED SHIELDING FILM, AND METHOD FOR MANUFACTURING INFRARED SHIELDING FILM

PROBLEM TO BE SOLVED: To provide an evaluation method for appropriately obtaining a heat-shielding effect in an actual installation of a film in which an incident angle of sunlight changes.SOLUTION: An evaluation method for dielectric multilayer type infrared shielding films includes: a step (1) of...

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1. Verfasser: KOKEGUCHI NORIYUKI
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide an evaluation method for appropriately obtaining a heat-shielding effect in an actual installation of a film in which an incident angle of sunlight changes.SOLUTION: An evaluation method for dielectric multilayer type infrared shielding films includes: a step (1) of obtaining a relation between a sunlight incident angle and irradiation energy at an installation place of a dielectric multilayer type infrared shielding film including a dielectric multilayer film; a step (2) of obtaining a central incident angle that is an incident angle in the irradiation energy reaching the maximum in the step (1); a step (3) of obtaining a short wave-side band uplink wavelength λ from a spectrophotometric curve in the central incident angle of the dielectric multilayer type infrared shielding film; and a step (4) for evaluating A=|λ-700nm| as a numerical index.