SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF THE SAME

PROBLEM TO BE SOLVED: To inhibit manufacturing variation in metal wiring resistance of a semiconductor device.SOLUTION: A semiconductor device comprises a metal wiring resistance formed in a first region and a plurality of via resistance formed in a second region in the same layer with the first reg...

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Bibliographische Detailangaben
1. Verfasser:	KUMAMOTO KEITA
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
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