EXPOSURE DEVICE AND EXPOSED MATERIAL MANUFACTURING METHOD

PROBLEM TO BE SOLVED: To more accurately specify the relative positions of an exposure mask and a target exposure material without using a complex, expensive mechanism, and to eliminate delay of operation time using an exposure device.SOLUTION: The exposure device according to the present invention...

Ausführliche Beschreibung

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Bibliographische Detailangaben
1. Verfasser: HASHIMOTO KAZUSHIGE
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:PROBLEM TO BE SOLVED: To more accurately specify the relative positions of an exposure mask and a target exposure material without using a complex, expensive mechanism, and to eliminate delay of operation time using an exposure device.SOLUTION: The exposure device according to the present invention comprises: an imaging section configured to image at least part of a first aligning mark and a second aligning mark, which are imaged on an exposure mask via a micro-lens array and to move in a predetermined direction so as to prevent interference with exposure to a target exposure material after imaging; an aligning control section configured to align the target exposure material and exposure mask on the basis of position information on first and second aligning marks; and an exposure start timing control section that starts emission of exposure light from a light source before the movement of the imaging section finishes.