IMPRINT DEVICE, ARTICLE MANUFACTURING METHOD USING THE SAME, AND IMPRINT METHOD

PROBLEM TO BE SOLVED: To provide an imprint device that is advantageous in terms of efficiency of die shape correction or alignment processing.SOLUTION: An imprint device includes: a holding part 10 for holding a die 7 using an absorption part 30 having a plurality of absorption force generation par...

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1. Verfasser: MIYATA MASAKI
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide an imprint device that is advantageous in terms of efficiency of die shape correction or alignment processing.SOLUTION: An imprint device includes: a holding part 10 for holding a die 7 using an absorption part 30 having a plurality of absorption force generation parts 34; an absorption force adjustment part 31 for making absorption forces by the plurality of absorption force generation parts 34 adjustable independently of each other; and a shape correction part 32 for bringing a shape of a pattern region 7a of the die 7 into coincidence with a shape of a substrate-side pattern region of a substrate by applying a force to the die 7, wherein when the force is applied to the die 7 by the shape correction part 32, the absorption force adjustment part 31 sets a predetermined region of an absorption surface for absorption of the die 7 as an absorption region 38 and adjusts the absorption forces by the plurality of absorption force generation parts 34 so that the absorption forces in a region 37 other than the absorption region 38 become smaller than those in the absorption region 38.