PATTERN FORMATION DEVICE AND PATTERN FORMATION METHOD

PROBLEM TO BE SOLVED: To suitably shape a start terminal part and an end terminal part of a pattern and to form them at desired positions.SOLUTION: A pattern formation device forms a linear pattern on a substrate by discharging a paste-like pattern forming material from a discharge port of a nozzle...

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Bibliographische Detailangaben
Hauptverfasser: OGASAWARA MITSUO, SEGAWA KUNIHIKO, IWASHIMA MASANOBU, RIKUI HIDEAKI
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:PROBLEM TO BE SOLVED: To suitably shape a start terminal part and an end terminal part of a pattern and to form them at desired positions.SOLUTION: A pattern formation device forms a linear pattern on a substrate by discharging a paste-like pattern forming material from a discharge port of a nozzle part. The pattern forming material is discharged by controlling a speed of variation in volume of a storage space where the pattern forming material is stored. When the pattern begins to be formed, the volume of the storage space decreases at an initial discharge speed (step S12), and the substrate 9 begins to be moved a movement wait time later (step S13). The volume of the storage space decreases at a normal discharge speed an initial operation time later (step S14). When the formation of the pattern is ended, suck-back operation is performed by increasing the volume of the storage space by a suck-back amount (step S16), and a movement of the substrate 9 stops at the same time with the end of the suck-back operation (step S17).