FILM FORMING DEVICE AND FILM FORMING METHOD

PROBLEM TO BE SOLVED: To provide a film forming device capable of improving throughput and forming a high-quality film when forming a film for a plurality of processed substrates.SOLUTION: A film forming device 11 includes: a processing container 12 comprising a bottom wall 16, an outer wall 17, and an inner wall 18; a support base 13 which can move in a vertical direction; a plasma generating mechanism 14; a gas supply mechanism 15; and a control unit which alternately controls first processing and second processing. The first processing moves the support base 13 to the lower side of the film forming device, forms a first space between a mounting part 37 and the inner wall 18, supplies a film forming gas to the first space by the gas supply mechanism 15, and performs film forming gas absorption treatment for a plurality of processed substrates W. The second processing moves the support base 13 to the upper side of the film forming device, forms a second space 71 different from the first space between the mounting part 37, the outer wall 17, and a dielectric window 46a, supplies a gas for plasma processing to the second space 71 by the gas supply mechanism 15, generates plasma by the plasma generation mechanism 14, and performs plasma processing for the plurality of processed substrates W.