SUBSTRATE CLEANING APPARATUS

PROBLEM TO BE SOLVED: To provide a substrate cleaning apparatus which efficiently conducts cleaning.SOLUTION: This invention relates to a substrate cleaning apparatus 60 including a transport part TRP transporting a substrate S in a predetermined direction and an ultrasonic oscillation part 63 which...

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1. Verfasser: SHIMAI FUTOSHI
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a substrate cleaning apparatus which efficiently conducts cleaning.SOLUTION: This invention relates to a substrate cleaning apparatus 60 including a transport part TRP transporting a substrate S in a predetermined direction and an ultrasonic oscillation part 63 which provides ultrasonic waves to a rear surface S2 of the substrate S transported in the predetermined direction by the transport part TRP thereby cleaning the surface side of the substrate S. The ultrasonic oscillation part 63 includes: a liquid supply part 62 which places a liquid SW in contact with the rear surface S2 of the substrate S utilizing surface tension; and a vibrator providing ultrasonic vibrations to the liquid SW.