METHOD FOR PRODUCING THIN FILM, THIN FILM PRODUCTION APPARATUS, AND METHOD FOR PRODUCING LIQUID CRYSTAL DISPLAY

PROBLEM TO BE SOLVED: To provide a method for producing a thin film which suppresses the frequency of generation of arcing and can suppress the adhesion of foreign matter to a substrate.SOLUTION: The method for producing a thin film includes: arranging a magnet unit 5 including a first magnet 51 hav...

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Bibliographische Detailangaben
Hauptverfasser:	INOUE HIRONOBU, YONEKURA HIROAKI
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a method for producing a thin film which suppresses the frequency of generation of arcing and can suppress the adhesion of foreign matter to a substrate.SOLUTION: The method for producing a thin film includes: arranging a magnet unit 5 including a first magnet 51 having a first polarity on its top face which is opposed to a target 94 and a second magnet 52 which has a second polarity on its top face and is arranged around the first magnet 51, and reducing the closest distance in the Y direction between the outside edge 52a of the magnet unit 5 and the outside edge 94a of the target 94 depending on an increase in the amount of the target 94 used.