VACUUM TREATMENT METHOD AND METHOD FOR MANUFACTURING ELECTROPHOTOGRAPHIC PHOTORECEPTOR
PROBLEM TO BE SOLVED: To provide a vacuum treatment method which can prevent a dust remaining on a surface of a ring-like member from flying out from a minute gap in a contact region between an end surface of a cylindrical substrate and an end surface of a cylindrical auxiliary substrate during evac...
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Format: | Patent |
Sprache: | eng |
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Zusammenfassung: | PROBLEM TO BE SOLVED: To provide a vacuum treatment method which can prevent a dust remaining on a surface of a ring-like member from flying out from a minute gap in a contact region between an end surface of a cylindrical substrate and an end surface of a cylindrical auxiliary substrate during evacuating a conveying container, and to provide a method for manufacturing an electrophotographic photoreceptor using the vacuum treatment method.SOLUTION: A through-hole is formed in a tubular part of a substrate holder to which the ring-like member and the cylindrical substrate are mounted. The conveying container is evacuated while at least part of a through-hole of the ring-like member and at least part of the through-hole of the substrate holder are superposed each other. |
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