VACUUM TREATMENT METHOD AND METHOD FOR MANUFACTURING ELECTROPHOTOGRAPHIC PHOTORECEPTOR

PROBLEM TO BE SOLVED: To provide a vacuum treatment method which can prevent a dust remaining on a surface of a ring-like member from flying out from a minute gap in a contact region between an end surface of a cylindrical substrate and an end surface of a cylindrical auxiliary substrate during evac...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
1. Verfasser: HOSOI KAZUTO
Format: Patent
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:PROBLEM TO BE SOLVED: To provide a vacuum treatment method which can prevent a dust remaining on a surface of a ring-like member from flying out from a minute gap in a contact region between an end surface of a cylindrical substrate and an end surface of a cylindrical auxiliary substrate during evacuating a conveying container, and to provide a method for manufacturing an electrophotographic photoreceptor using the vacuum treatment method.SOLUTION: A through-hole is formed in a tubular part of a substrate holder to which the ring-like member and the cylindrical substrate are mounted. The conveying container is evacuated while at least part of a through-hole of the ring-like member and at least part of the through-hole of the substrate holder are superposed each other.