VAPORIZATION METHOD FOR LIQUID RAW MATERIAL
PROBLEM TO BE SOLVED: To provide a vaporization method for a liquid raw material capable of effectively improving a vaporization efficiency at a prescribed temperature in a vaporization chamber and heightening the partial pressure of a raw material gas in a reaction chamber, in the vaporization meth...
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Format: | Patent |
Sprache: | eng |
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Zusammenfassung: | PROBLEM TO BE SOLVED: To provide a vaporization method for a liquid raw material capable of effectively improving a vaporization efficiency at a prescribed temperature in a vaporization chamber and heightening the partial pressure of a raw material gas in a reaction chamber, in the vaporization method of the liquid raw material as the raw material gas to be introduced in the reaction chamber by vaporizing the liquid raw material when introducing the raw material gas and a reducing gas in the reaction chamber to form a film on the surface of a substrate set in the reaction chamber by precipitation from a gas phase.SOLUTION: The liquid raw material is sprayed in the vaporization chamber 22 by feeding the liquid raw material through the raw material feeding paths 32, 42 communicating to the vaporization chamber 22, and jetting a carrier gas from the inlet periphery of the raw material feeding path. The sprayed liquid raw material is vaporized in the vaporization chamber heated to a prescribed temperature by heat exchange, and the vaporized raw material gas is discharged from a discharge port opened to the vaporization chamber. A gas-liquid mixture obtained by mixing a reducing gas of a prescribed flow into the liquid raw material in the raw material feeding path is jetted from the inlet into the vaporization chamber. |
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