LIQUID PROCESSING DEVICE, LIQUID PROCESSING METHOD, AND RECORDING MEDIUM

PROBLEM TO BE SOLVED: To clean a substrate support part for supporting a substrate or a top board rotating with the substrate by using a rinse liquid supplied to the substrate, during a liquid processing step.SOLUTION: A liquid processing device 100 includes: a rotatable substrate support part 10 fo...

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Bibliographische Detailangaben
Hauptverfasser:	NAGAMINE SHUICHI, HASHIMOTO YUSUKE
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CLEANING CLEANING IN GENERAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY PERFORMING OPERATIONS PREVENTION OF FOULING IN GENERAL SEMICONDUCTOR DEVICES TRANSPORTING
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