RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER COMPOUND, AND NOVEL COMPOUND

PROBLEM TO BE SOLVED: To provide a resist composition, a method for forming a resist pattern, a polymer compound, and a novel compound.SOLUTION: A resist composition which generates an acid by exposure and a solubility of which in a developer is changed by an action of an acid. The composition conta...

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1. Verfasser:	UTSUMI YOSHIYUKI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MATERIALS THEREFOR METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS THEIR PREPARATION OR CHEMICAL WORKING-UP
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a resist composition, a method for forming a resist pattern, a polymer compound, and a novel compound.SOLUTION: A resist composition which generates an acid by exposure and a solubility of which in a developer is changed by an action of an acid. The composition contains a base component (A) whose solubility in a developer is changed by an action of an acid. The base component (A) contains a resin component (A1) having a structural unit (a0-1) represented by formula (a0-1). In the formula, R represents a hydrogen atom, a 1-5C alkyl group or a 1-5C halogenated alkyl group.