RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, NOVEL COMPOUND, AND ACID GENERATOR

PROBLEM TO BE SOLVED: To provide a resist composition excellent in lithographic characteristics, a method for forming a resist pattern, a novel compound, and an acid generator.SOLUTION: The resist composition comprises a base component (A) the solubility of which with a developing solution changes b...

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Bibliographische Detailangaben
1. Verfasser:	UTSUMI YOSHIYUKI
Format:	Patent
Sprache:	eng
Schlagworte:	ACYCLIC OR CARBOCYCLIC COMPOUNDS ADHESIVES APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CHEMISTRY CINEMATOGRAPHY DYES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HETEROCYCLIC COMPOUNDS HOLOGRAPHY MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE MATERIALS THEREFOR METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS ORGANIC CHEMISTRY ORIGINALS THEREFOR PAINTS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS POLISHES SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a resist composition excellent in lithographic characteristics, a method for forming a resist pattern, a novel compound, and an acid generator.SOLUTION: The resist composition comprises a base component (A) the solubility of which with a developing solution changes by an action of an acid, and an acid generator component (B) that generates an acid by exposure. The acid generator component (B) includes an acid generator (B1) comprising a compound expressed by formula (b1-1). In the formula, Zrepresents an organic cation; Qand Qrepresent a fluorine atom or a straight-chain or branched-chain 1-6C fluorinated alkyl group; X represents -(CH)-; Y represents a single bond, -O-(CH)- or -C(=O)-O-(CH)-; L1 and m1 represent an integer of 1 to 6; Rx represents a 2-36C divalent aliphatic hydrocarbon group having a C=C unsaturated bond and optionally having a substituent; and Ry represents an acid dissociable group.