FOCUSED ION BEAM DEVICE

PROBLEM TO BE SOLVED: To provide a focused ion beam device which efficiently carries out fine patterning with less damage to a sample by using a gas field ionization ion source.SOLUTION: A focused ion beam device includes a gas field ionization ion source having: an emitter 41 for emitting an ion be...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: MATSUDA OSAMU, KOSAKAI TOMOKAZU, YASAKA KOJIN, SUGIYAMA YASUHIKO, ARAMAKI BUNRO
Format: Patent
Sprache:eng
Schlagworte:
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