FOCUSED ION BEAM DEVICE
PROBLEM TO BE SOLVED: To provide a focused ion beam device which efficiently carries out fine patterning with less damage to a sample by using a gas field ionization ion source.SOLUTION: A focused ion beam device includes a gas field ionization ion source having: an emitter 41 for emitting an ion be...
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Sprache: | eng |
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Zusammenfassung: | PROBLEM TO BE SOLVED: To provide a focused ion beam device which efficiently carries out fine patterning with less damage to a sample by using a gas field ionization ion source.SOLUTION: A focused ion beam device includes a gas field ionization ion source having: an emitter 41 for emitting an ion beam 1; an ion source chamber 40 for housing the emitter 41; a gas supply part 46 for supplying nitrogen to the ion source chamber 40; an extraction electrode 49 for applying an extraction voltage to ionize and extract nitrogen ions; and a temperature control part 34 for cooling the emitter 41. |
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