COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, RESIST UNDERLAYER FILM AND METHOD FOR FORMING THE SAME, AND METHOD FOR FORMING PATTERN

PROBLEM TO BE SOLVED: To provide a composition for forming a resist underlayer film, which satisfies demands for the characteristics of a resist underlayer film relating to a refractive index and an attenuation coefficient, and which allows formation of a resist underlayer film having high heat resi...

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Bibliographische Detailangaben
Hauptverfasser:	MOTONARI MASAYUKI, NAKAFUJI SHINYA, MURAKAMI AKIRA, TAKIMOTO YOSHIO
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON COMPOSITIONS OF MACROMOLECULAR COMPOUNDS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS MATERIALS THEREFOR METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES THEIR PREPARATION OR CHEMICAL WORKING-UP
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a composition for forming a resist underlayer film, which satisfies demands for the characteristics of a resist underlayer film relating to a refractive index and an attenuation coefficient, and which allows formation of a resist underlayer film having high heat resistance while maintaining high flexural resistance of a pattern formed in the resist underlayer film, and to provide a resist underlayer film, a method for forming the film, and a method for forming a pattern.SOLUTION: The composition for forming a resist underlayer film comprises [A] a polymer having a structural unit (I) expressed by formula (1). In formula (1), Arand Arrespectively independently represent a divalent group expressed by formula (2). In formula (2), Rand Rrespectively independently represent a divalent aromatic group; Rrepresents a single bond, -O-, -CO-, -SO- or -SO-; and (a) represents an integer of 0 to 3, wherein when (a) is 2 or more, a plurality of Rand a plurality of Rmay be the same or different respectively.