INSPECTION DEVICE, LITHOGRAPHIC APPARATUS, AND DEVICE MANUFACTURING METHOD

PROBLEM TO BE SOLVED: To provide an improved inspection device, a catadioptric objective system, and a refraction objective system.SOLUTION: An inspection device 500 includes: a catadioptric objective system 504 which is formed so as to receive a first beam 522 and guide the first beam 524 for refle...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	SHMAREV YEVGENIY KONSTANTINOVICH, HEALD DAVID, RICO SCHUSTER, CATEY ERIC BRIAN, JOOBEUR ADEL, JACOBS RICHARD DAVID, STANISLAV Y SMIRNOV
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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