INSPECTION DEVICE, LITHOGRAPHIC APPARATUS, AND DEVICE MANUFACTURING METHOD

PROBLEM TO BE SOLVED: To provide an improved inspection device, a catadioptric objective system, and a refraction objective system.SOLUTION: An inspection device 500 includes: a catadioptric objective system 504 which is formed so as to receive a first beam 522 and guide the first beam 524 for reflecting the first beam 524 from a wafer 508; a first sensor 510 detecting a first image created by the reflected beam; a refraction objective system 506 which is formed so as to guide a second beam 524 for reflecting the second beam 524 from the wafer 508; and a second sensor 512 for detecting a second image created by the reflected beam. The inspection device 500 may include a third sensor 514 which is formed so as to detect a third image created by the beam reflected from the wafer. The first and second images are used for CD measurement, and the third image is used for OV measurement. The second beam has a spectral range of approximately 200 nm to approximately 425 nm, and the third beam has a spectral range of approximately 425 nm to approximately 850 nm.