CHARGED PARTICLE BEAM DEVICE SUPPORTING IMAGE CLASSIFICATION

PROBLEM TO BE SOLVED: To reduce the operation burden of process margin evaluation in a semiconductor manufacturing stage on a person.SOLUTION: A charged particle beam device executes a step 402 of automatically determining the quality of an observation object on the basis of information obtained fro...

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Bibliographische Detailangaben
Hauptverfasser: MIYAKE KOZO, OBARA KENJI, HIRAI TOMOHIRO
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To reduce the operation burden of process margin evaluation in a semiconductor manufacturing stage on a person.SOLUTION: A charged particle beam device executes a step 402 of automatically determining the quality of an observation object on the basis of information obtained from an image of the observation object on a wafer, and displaying a determination result on a screen; a step 403 of extracting an observation object whose quality needs to be corrected as instructed by a user from determination results, and displaying the observation object; and a step 404 of performing processing for correcting a determination result corresponding to the extracted and displayed observation result as instructed by the user.