COMPOSITION AND ANTI-REFLECTIVE COATING FOR PHOTOLITHOGRAPHY

PROBLEM TO BE SOLVED: To provide a composition for photolithography.SOLUTION: The composition contains a polymer composed of a polymer containing the following A and a polymer formed from silane; wherein A is a structural unit 1 represented by formula (1) (in the formula, L is a C-C bond; and M is a...

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Hauptverfasser:	SRIVASTAVA YASMIN N, RAO YUANQIAO, AUGER ROBERT L, KIARIE CECILIA W, SULLIVAN CHRISTOPHER P
Format:	Patent
Sprache:	eng
Schlagworte:	AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON COMPOSITIONS OF MACROMOLECULAR COMPOUNDS ELECTROGRAPHY GENERAL PROCESSES OF COMPOUNDING HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS MATERIALS THEREFOR METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS THEIR PREPARATION OR CHEMICAL WORKING-UP WORKING-UP
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a composition for photolithography.SOLUTION: The composition contains a polymer composed of a polymer containing the following A and a polymer formed from silane; wherein A is a structural unit 1 represented by formula (1) (in the formula, L is a C-C bond; and M is a divalent bonding group; having a group selected from an oxygen-containing group and halide on Si).