EXPOSURE DEVICE, EXPOSURE METHOD AND METHOD FOR MANUFACTURING DISPLAY PANEL SUBSTRATE

PROBLEM TO BE SOLVED: To supply a large amount of drawing data to drive circuits of a spatial optical modulator at a high speed, and correct variations in exposure intensity due to distortion of optical components included in an irradiation optical system of a light beam irradiation device to improve drawing accuracy.SOLUTION: An exposure device divides drawing data for each of coordinates at equal intervals corresponding to a distance between centers of adjacent mirrors of a spatial optical modulator of a light beam irradiation device in a direction perpendicular to a scanning direction of a substrate by a light beam to store the divided data in a memory 72 collectively for each of the coordinates at equal intervals, and reads the drawing data from the memory 72 collectively for each of the coordinates at equal intervals in association with scanning of the substrate by the light beam, and corrects the coordinates of the drawing data read from the memory 72 according to distortion of optical components included in an irradiation optical system of the light beam irradiation device to supply the corrected drawing data to drive circuits (DMD drive circuits 27) of the light beam irradiation device.