APPARATUS FOR MANUFACTURING REFLECTIVE MASK FOR EUVL AND MASK BLANK FOR EUVL

PROBLEM TO BE SOLVED: To provide an apparatus for manufacturing a mask (mask blank) for EUVL (extreme-ultraviolet lithography), which restrains an influence from being exerted by pressure fluctuations for a short time.SOLUTION: An apparatus 20 for manufacturing a reflective mask (mask blank) for EUV...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	UMEO NAOHIRO, ISE HIROTOSHI, MITSUMORI TAKAHIRO
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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