APPARATUS FOR MANUFACTURING REFLECTIVE MASK FOR EUVL AND MASK BLANK FOR EUVL

PROBLEM TO BE SOLVED: To provide an apparatus for manufacturing a mask (mask blank) for EUVL (extreme-ultraviolet lithography), which restrains an influence from being exerted by pressure fluctuations for a short time.SOLUTION: An apparatus 20 for manufacturing a reflective mask (mask blank) for EUV lithography includes a fan filter unit 25 which introduces clean air, introduced into a working area 11 of a clean room 10, as ultraclean air into the apparatus 20, an opening 24 for carrying-out and carrying-in, and an opening 26 for exhaust. An opening 27 for a breathing mechanism is provided in a position on the downstream side with respect to the opening for carrying-out and carrying-in and on the upstream side with respect to the opening for exhaust, in the circulating direction of the ultraclean air in the apparatus 20. The apparatus 20 also includes the breathing mechanism which introduces the clean air into or discharges the clean air from the apparatus 20, depending on a fluctuation in pressure difference between pressure in the apparatus 20 and pressure in the working area 11 of the clean room 10.