GRADATION MASK

PROBLEM TO BE SOLVED: To provide a gradation mask, with which manufacturing processes of a display device can be simplified and a pattern is advantageously formed.SOLUTION: The gradation mask for manufacturing a display device to be used for manufacturing a display device comprises a transparent sub...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	USHIKUSA MASATO, SUZUKI AYA, MORI HIROSHI, FUJIKAWA JUNJI, TAKAHASHI MASAYASU
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a gradation mask, with which manufacturing processes of a display device can be simplified and a pattern is advantageously formed.SOLUTION: The gradation mask for manufacturing a display device to be used for manufacturing a display device comprises a transparent substrate, a light-shielding film and a translucent film having a function of controlling transmittance, layered in a random order, and includes a light-shielding region where the light-shielding film is formed on the transparent substrate, a translucent region where only the translucent film is formed on the transparent substrate, and a transmissive region where neither the light-shielding film nor the translucent film is formed on the transparent substrate. The translucent film comprises a metal film. The gradation mask for manufacturing a display device includes no etching stopper film.