TOP ROLL POLISHING DEVICE

PROBLEM TO BE SOLVED: To provide a top roll polishing device capable of reducing the generation of foreign substances originating from a polishing roll itself during polishing, and thus reducing defects caused by foreign substances peeled off from the polishing roll.SOLUTION: With respect to the top...

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Bibliographische Detailangaben
Hauptverfasser: NAKAZATO KAZUKI, INOUE NAOKI
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:PROBLEM TO BE SOLVED: To provide a top roll polishing device capable of reducing the generation of foreign substances originating from a polishing roll itself during polishing, and thus reducing defects caused by foreign substances peeled off from the polishing roll.SOLUTION: With respect to the top roll polishing device (polisher) 10 whose polishing roll 11 is brought to polish the surface of a top roll 8 mounted on a continuous molten metal plating line, a polishing roll of a shape with the ratio R of the length L of the polishing roll 11 (length of a polishing cloth 11b) with respect to the diameter D of the polishing roll 11 being 0.15 or lower is used as the polishing roll 11. In addition, a controller 20 controls a drive motor 12 so that the rotational speed of the polishing roll 11 is 19 m/s or higher.