PHOTOSENSITIVE RESIN COMPOSITION, RELIEF PATTERN FORMING MATERIAL, PHOTOSENSITIVE FILM, POLYIMIDE FILM, CURED RELIEF PATTERN, METHOD FOR MANUFACTURING CURED RELIEF PATTERN, AND SEMICONDUCTOR DEVICE

PROBLEM TO BE SOLVED: To provide a photosensitive resin composition capable of forming a cured relief pattern which has a lithography performance excellent in resolution and sensitivity and prevents the warpage of a wafer through low-temperature curing, and to provide a relief pattern forming materi...

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Bibliographische Detailangaben
Hauptverfasser:	WADA KENJI, ARAYAMA KYOHEI, AMAMIYA TAKUMA
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS MATERIALS THEREFOR METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES THEIR PREPARATION OR CHEMICAL WORKING-UP
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a photosensitive resin composition capable of forming a cured relief pattern which has a lithography performance excellent in resolution and sensitivity and prevents the warpage of a wafer through low-temperature curing, and to provide a relief pattern forming material using the photosensitive resin composition, a photosensitive film, a polyimide film, a cured relief pattern, a method for manufacturing the cured relief pattern, and a semiconductor device including the cured relief pattern.SOLUTION: A photosensitive resin composition contains (a) a resin having a repeating unit represented by formula (1), and (b) a compound for generating an acid by irradiation of active rays or radiation. In the formula (1), Rrepresents a bivalent organic group. A plurality of Rmay be the same or different from one another. At least one Rout of the plurality of Ris a bivalent organic group having an alicyclic group. Reach independently represents a hydrogen atom or an organic group. At least one -CORout of the plurality of -CORis a group which is decomposed by the action of an acid to generate an alkaline soluble group.