METHOD FOR FORMING OPTICAL WAVEGUIDE STRUCTURE, AND OPTICAL WAVEGUIDE STRUCTURE

PROBLEM TO BE SOLVED: To provide a method for forming an optical waveguide structure which can reduce optical loss without providing an offset.SOLUTION: In a method for forming an optical waveguide structure, a semiconductor layer 60A is provided on a substrate 2, a mask 71 is formed on the semicond...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: FUKUDA CHIE, SEKI MORIHIRO
Format: Patent
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:PROBLEM TO BE SOLVED: To provide a method for forming an optical waveguide structure which can reduce optical loss without providing an offset.SOLUTION: In a method for forming an optical waveguide structure, a semiconductor layer 60A is provided on a substrate 2, a mask 71 is formed on the semiconductor layer 60A, the semiconductor layer 60A is etched by using the mask 71 to form a waveguide mesa 5, a first terrace 3, a second terrace 4, a first trench 6, and a second trench 7, a resin body 9 is provided so that the waveguide mesa 5 is embedded therein, a metal body 10 is provided on the upper face 5a of the waveguide mesa 5 and the resin body 9, the metal body 10 is heated, and then cooled. The metal body 10 includes a first portion 11 provided on a first region 21, a second portion 12 provided on a second region 22, and a third portion 13 which is connected to the first portion and the second portion and is joined to the upper face 5a of the waveguide mesa 5. The first portion 11 is longer than the second portion 12.