PRE-SHRINK SHAPE ESTIMATION METHOD AND CD-SEM APPARATUS

PROBLEM TO BE SOLVED: To highly accurately estimate a shape and a dimension before shrink when measuring a length of resist to be shrunk by electron beam irradiation by CD-SEM.SOLUTION: A shrink database including pre-electron-beam-irradiation cross-sectional shape data, a cross-sectional shape data...

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Bibliographische Detailangaben
Hauptverfasser:	OMORI KIYOKO, TEI TOMOKI, KAWADA HIROKI, OHASHI KENYOSHI, SEKIGUCHI TOMOKO, TANAKA JUNICHI, TOKIDA RURIKO
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS PHYSICS SEMICONDUCTOR DEVICES TESTING
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To highly accurately estimate a shape and a dimension before shrink when measuring a length of resist to be shrunk by electron beam irradiation by CD-SEM.SOLUTION: A shrink database including pre-electron-beam-irradiation cross-sectional shape data, a cross-sectional shape data group and a CD-SEM image data group obtained under various electron beam irradiation conditions, and models based on them is prepared for various patterns, a CD-SEM image of a resist pattern to be measured is acquired (S102), the CD-SEM image and the shrink database are collated (S103), and the shape and the dimension before the shrink of the pattern to be measured are estimated and outputted (S104).